DocumentCode :
1117092
Title :
High-field transport in InGaAs/InAlAs modulation-doped heterostructures
Author :
Hong, Won-Pyo ; Bhattacharya, Pallab K.
Author_Institution :
University of Michigan, Ann Arbor, MI
Volume :
34
Issue :
7
fYear :
1987
fDate :
7/1/1987 12:00:00 AM
Firstpage :
1491
Lastpage :
1495
Abstract :
The velocity-field and mobility-field characteristics of normal and inverted InGaAs/InAlAs modulation-doped heterostructures grown by molecular-beam epitaxy have been measured at 300 and 77 K. Veloczities of 3.0 × 107and 1.7 × 107cm/s have been measured in the normal and inverted structures, respectively, at 77 K. Current instabilities are observed at the corresponding field values. Hall mobilities decrease With field beyond 500 V/cm, principally due to phonon scattering. The mobilities in normal and inverted heterostructures attain Similar values at fields higher than 1 kV/cm, irrespective of the low-field values.
Keywords :
Current measurement; Epitaxial layers; FETs; Gallium arsenide; Hall effect; Indium compounds; Indium gallium arsenide; Indium phosphide; Molecular beam epitaxial growth; Velocity measurement;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1987.23110
Filename :
1486821
Link To Document :
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