• DocumentCode
    1117100
  • Title

    Denuded zone stability in a SPAD diode as a function of out-diffusion parameters

  • Author

    Poggi, Antonella ; Reiche, Manfred ; Susi, Enrichetta

  • Author_Institution
    CNR--Istituto LAMEL, Bologna, Italy
  • Volume
    34
  • Issue
    7
  • fYear
    1987
  • fDate
    7/1/1987 12:00:00 AM
  • Firstpage
    1496
  • Lastpage
    1500
  • Abstract
    The effect of a complete fabrication cycle of a single photon avalanche diode (SPAD) on denuded zone presence and width is reported. The heavy diffusion stage required to create a deep guard ring junction appears to be the most deleterious for the denuded zone stability and the final bulk defect content. The out-diffusion step parameters are decisive in assuring the denuded zone stability: the use of a chlorinated oxidizing ambient during the out-diffusion treatment appears to be sufficient to maintain a satisfactory denuded zone width even after the heavy-diffusion stage. The role of process-induced defects, in particular of the interstitials, is stressed out.
  • Keywords
    Crystals; Diodes; Fabrication; Gettering; Helium; History; Reproducibility of results; Silicon; Stability; Surface treatment;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1987.23111
  • Filename
    1486822