Title :
A high-speed 1-kbit high electron mobility transistor static RAM
Author :
Sheng, N.H. ; Wang, H.T. ; Lee, C.P. ; Sullivan, G.J. ; Miller, D.L.
Author_Institution :
Rockwell International Science Center, Thousand Oaks, CA
fDate :
8/1/1987 12:00:00 AM
Abstract :
A 1-kbit static RAM with enhancement and depletion-mode devices was designed and fabricated using the high electron mobility transistor (HEMT) technology. The RAM circuit was optimized to achieve ultra-high-speed performance. A subnanosecond address access time of 0.6 ns was measured at room temperature for a total power dissipation of 450 mW. The minimum WRITE-ENABLE pulse width required to change the state of memory cell is less than 2 ns on probe testing. The best chip has 3 bits that failed to function, which corresponds to a bit yield of 99.7 percent. According to the simulation, variations of the threshold voltage inside the memory cell greatly reduce its stable functional range. High-speed operation requires more uniform threshold voltage control to achieve fully operational LSI memory circuits.
Keywords :
Circuits; HEMTs; MODFETs; Power dissipation; Power measurement; Read-write memory; Semiconductor device measurement; Temperature measurement; Threshold voltage; Time measurement;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1987.23135