Title :
Ion-sensing devices with silicon nitride and borosilicate glass insulators
Author :
Harame, David L. ; Bousse, Luc J. ; Shott, John D. ; Meindl, James D.
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
fDate :
8/1/1987 12:00:00 AM
Abstract :
Ion-sensitive field-effect transistors (ISFET´s) with silicon dioxide, silicon nitride, and borosilicate glass as the active gate material were fabricated and tested for pH-sensing applications. The borosilicate glass and silicon nitride devices were found to have a linear potential/pH response and previous theories of ISFET function were inadequate to explain this. A two-site theory is presented that can explain the features of the potential/pH response of both silicon nitride and borosilicate glass ISFETs. The model is easily extended to any two-site system.
Keywords :
Dielectric measurements; Dielectrics and electrical insulation; Electric potential; FETs; Glass; Hydrogen; Insulator testing; Production facilities; Silicon compounds; Surface treatment;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1987.23140