• DocumentCode
    1117497
  • Title

    The resonant-tunneling field-effect transistor: A new negative transconductance device

  • Author

    Sen, Susanta ; Capasso, Federico ; Beltram, Fabio ; Cho, Alfred Y.

  • Author_Institution
    University of Calcutta, Calcutta, India
  • Volume
    34
  • Issue
    8
  • fYear
    1987
  • fDate
    8/1/1987 12:00:00 AM
  • Firstpage
    1768
  • Lastpage
    1773
  • Abstract
    A new field-effect transistor with a resonant-tunneling barrier in the gate is presented. The gate and the drain currents versus gate voltage exhibit peaks when the resonant-tunneling gate current is quenched. Thus, in addition to negative differential resistance, this structure also exhibits negative transconductance, a unique feature in an n-channel device. Also, by proper gate bias, the same resonance of the double barrier can be used to produce two peaks in the drain current versus drain voltage characteristic at nearly the same current level. This is a very desirable feature for many applications.
  • Keywords
    Bipolar transistors; Double-gate FETs; Electrodes; Gallium arsenide; Gold; Proposals; Resonant tunneling devices; Transconductance; Voltage; Wet etching;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1987.23149
  • Filename
    1486860