DocumentCode
1117497
Title
The resonant-tunneling field-effect transistor: A new negative transconductance device
Author
Sen, Susanta ; Capasso, Federico ; Beltram, Fabio ; Cho, Alfred Y.
Author_Institution
University of Calcutta, Calcutta, India
Volume
34
Issue
8
fYear
1987
fDate
8/1/1987 12:00:00 AM
Firstpage
1768
Lastpage
1773
Abstract
A new field-effect transistor with a resonant-tunneling barrier in the gate is presented. The gate and the drain currents versus gate voltage exhibit peaks when the resonant-tunneling gate current is quenched. Thus, in addition to negative differential resistance, this structure also exhibits negative transconductance, a unique feature in an n-channel device. Also, by proper gate bias, the same resonance of the double barrier can be used to produce two peaks in the drain current versus drain voltage characteristic at nearly the same current level. This is a very desirable feature for many applications.
Keywords
Bipolar transistors; Double-gate FETs; Electrodes; Gallium arsenide; Gold; Proposals; Resonant tunneling devices; Transconductance; Voltage; Wet etching;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1987.23149
Filename
1486860
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