DocumentCode :
1117560
Title :
Comparison of Si and InSb as the normal layer of S-N-S junctions
Author :
Hato, T. ; Akaike, H. ; Fujimaki, A. ; Takai, Y. ; Hayakawa, H.
Author_Institution :
Dept. of Electron., Nagoya Univ., Japan
Volume :
27
Issue :
2
fYear :
1991
fDate :
3/1/1991 12:00:00 AM
Firstpage :
2585
Lastpage :
2588
Abstract :
Superconductor-semiconductor-superconductor (S-N-S) weak-link junctions with a normal layer of Si or InSb thin films were prepared by using focused ion beam (FIB) methods. The electrical properties were measured. Whereas InSb thin films on single crystals did not have an intrinsic mobility, S-N-S junctions with InSb show the characteristics of a Josephson S-N-S junction. A 200-nm-thick film of InSb deposited on MgO has a mobility of 83 cm2/V-s and a carrier density of 6.5×1017 cm-3 at 4.2 K. The coherence length ξn was computed to be 17 nm. A critical superconducting current Ic of 100 μA was obtained for the S-N-S junction which had a line width of 10 μm and a channel length of 20 nm
Keywords :
Josephson effect; elemental semiconductors; niobium; silicon; superconducting junction devices; type II superconductors; 4.2 K; III-V semiconductors; Josephson S-N-S junction; Nb-InSb-Nb; Nb-Si-Nb; S-N-S junctions; carrier density; coherence length; critical superconducting current; electrical properties; focused ion beam; line width; mobility; superconductor-semiconductor-superconductor junctions; weak-link junctions; Charge carrier density; Fabrication; Ion beams; Josephson junctions; Niobium; Sputtering; Superconducting epitaxial layers; Superconducting films; Superconducting integrated circuits; Superconducting thin films;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.133744
Filename :
133744
Link To Document :
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