• DocumentCode
    1117814
  • Title

    Numerical analysis of GaAs epitaxial-layer Schottky diodes

  • Author

    Adams, John F. ; Jelenski, A. ; Navon, David H. ; Tang, Ting-wei

  • Author_Institution
    University of Massachusetts, Amherst, MA
  • Volume
    34
  • Issue
    9
  • fYear
    1987
  • fDate
    9/1/1987 12:00:00 AM
  • Firstpage
    1963
  • Lastpage
    1970
  • Abstract
    A computer simulation of GaAs epitaxial-layer Schottky-barrier diodes has been carried out. The present work extends previous drift-diffusion equation (DDE) Schottky-barrier diode simulations to very thin epilayers of GaAs as well as to higher forward bias voltages. Diodes having epitaxial layers of 0.12 and 1.0 µm were modeled with an emphasis on comparison with experiment. To achieve better agreement with experimental data an interfacial layer was included in the model, resulting in a voltage-dependent barrier height. The bias voltage at which the I-V characteristic becomes strongly nonideal is predicted to depend more on the potential drop across the interfacial layer than on the series resistances present in the devices studied. The separate contributions of the dynamic resistance of the junction and of the series resistances of the epitaxial and bulk regions to the total resistance were examined for forward biases up to 1.1 V.
  • Keywords
    Algorithm design and analysis; Computer simulation; Epitaxial layers; Equations; Fabrication; Gallium arsenide; Numerical analysis; Schottky diodes; Semiconductor process modeling; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1987.23182
  • Filename
    1486893