Title :
In-line control of nonlinear pH neutralization based on fuzzy logic
Author :
Parekh, Maulik ; Desai, Mehul ; Li, Hua ; Rhinehart, R. Russell
Author_Institution :
Dept. of Comput. Sci., Texas Tech. Univ., Lubbock, TX, USA
fDate :
6/1/1994 12:00:00 AM
Abstract :
pH control is important to semiconductor manufacturing, with some common applications including etching, acid treating, and wastewater neutralization. In particular, pH neutralization is notorious for its severe process nonlinearity, which is reflected in the titration curve and shows process gain change of up to 10000 to 1 over a very small region. In this paper, we describe a new technique of in-line control of pH neutralization based on fuzzy logic. The unique features of this fuzzy control technique include 1) a wider operation range for handling a nonlinear process, 2) robustness for dealing with random disturbances and possible system parameter drafting, and 3) relatively simple implementation. Laboratory experiments are performed demonstrating that the controller works well over a wide operational range
Keywords :
etching; fuzzy control; fuzzy logic; pH control; semiconductor process modelling; acid treating; etching; fuzzy control technique; fuzzy logic; in-line control; nonlinear pH neutralization; operation range; operational range; process gain change; process nonlinearity; random disturbances; robustness; semiconductor manufacturing; system parameter drafting; titration curve; wastewater neutralization; Aerospace control; Electrical equipment industry; Etching; Fuzzy control; Fuzzy logic; Laboratories; Petroleum; Process control; Uncertainty; Wastewater treatment;
Journal_Title :
Components, Packaging, and Manufacturing Technology, Part A, IEEE Transactions on