• DocumentCode
    1118026
  • Title

    Measurements of the anisotropy in permalloy

  • Author

    Eijekel, K.J.

  • Author_Institution
    Twente Univ. of Technol., Enschede, Netherlands
  • Volume
    24
  • Issue
    2
  • fYear
    1988
  • fDate
    3/1/1988 12:00:00 AM
  • Firstpage
    1957
  • Lastpage
    1959
  • Abstract
    A measurement system is described, which accurately determines the anisotropy field Hk and the orientation of the easy-axis in a permalloy film or in any material showing magnetization induced resistance anisotropy. An accuracy of 0.1% in Hk and 0.1 degrees in easy-axis orientation is reached in permalloy when the applied field strength is 2.5 Hk. Deviations from the Stoner-Wohlfarth single domain model can be recognized after the analysis of the measurement. Four electrical contacts have to be positioned on the permalloy in a planar-Hall configuration. Aluminum contacts realized by a standard lithographic process are used, providing a reference for the easy-axis orientation and an accurate relative orientation of the different planar-Hall elements that can be made out of a single film.
  • Keywords
    Hall effect; Permalloy; magnetic anisotropy; magnetic thin films; Fe-Ni; FeNi-Al; Stoner-Wohlfarth single domain model; anisotropy field; easy-axis; electrical contacts; lithographic process; magnetization induced resistance anisotropy; orientation; permalloy film; planar-Hall configuration; Amplifiers; Anisotropic magnetoresistance; Instruments; Magnetic analysis; Magnetic field measurement; Nonlinear dynamical systems; Position measurement; Q measurement; Signal generators; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.11658
  • Filename
    11658