Title :
IVB-8 applications of plasma-deposited SiN to wafer-scale integrated circuits
Author :
Burns, John A. ; Chapman, Glenn H. ; Herndon, T.O.
fDate :
11/1/1987 12:00:00 AM
Keywords :
Aluminum; Application specific integrated circuits; Insulation; Optical films; Plasma applications; Plasma immersion ion implantation; Plasma properties; Plasma temperature; Semiconductor films; Silicon compounds;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1987.23290
