DocumentCode
1118946
Title
IVB-8 applications of plasma-deposited SiN to wafer-scale integrated circuits
Author
Burns, John A. ; Chapman, Glenn H. ; Herndon, T.O.
Volume
34
Issue
11
fYear
1987
fDate
11/1/1987 12:00:00 AM
Firstpage
2374
Lastpage
2375
Keywords
Aluminum; Application specific integrated circuits; Insulation; Optical films; Plasma applications; Plasma immersion ion implantation; Plasma properties; Plasma temperature; Semiconductor films; Silicon compounds;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1987.23290
Filename
1487001
Link To Document