• DocumentCode
    1119060
  • Title

    Scenario normalization techniques - inline stepper coordinator design

  • Author

    Chung, Sheng-Luen ; Jeng, MuDer

  • Author_Institution
    Dept. of Electr. Eng., Nat. Taiwan Univ. of Sci. & Technol., Taiwan
  • Volume
    11
  • Issue
    3
  • fYear
    2004
  • Firstpage
    14
  • Lastpage
    21
  • Abstract
    In this paper, the scenario normalization technique is addressed, which is very useful in the context of generic equipment control, where an equipment-control system (ECS) is to control several pieces of equipment, possibly of different types. This paper begins with a background introduction to a photolithographic cell and the concept of generic equipment control adopted in semiconductor fabs. The concept of message modulation that translates in semantics context the sequence flows between the high-level ECS and the low-level equipment is presented. The main idea relies on the operational scenarios modeling by the sequence diagram; message translation based on semantics analysis; the derivation of production rules and the implementation of them on an event-triggering platform. Scenarios, thus obtained and presented to the high-level ECS by the coordinator, are then in compliance with the normalized scenario as required by the generic equipment controller. The significance of the proposed normalization techniques has the following implication: when different equipment are included in a cell operation, it is not necessary to rewrite control programs but to add relatively simpler transformation sequences enabling the use of the standard ECS function. From the control point of view, the controlled systems of stepper and track can be modeled as discrete event dynamic ones if operation coordination is considered.
  • Keywords
    control engineering computing; discrete event systems; manufacturing systems; materials handling; photolithography; semiconductor device manufacture; discrete event dynamic system; equipment-control system; event-triggering platform; generic equipment control; inline stepper coordinator design; photolithographic cell; scenario normalization techniques; semantics analysis; semiconductor fabs; stepper and track controlled systems; Automatic control; Communication system control; Control systems; Job shop scheduling; Manufacturing automation; Planarization; Production; Robotics and automation; Semiconductor device manufacture; Tracking;
  • fLanguage
    English
  • Journal_Title
    Robotics & Automation Magazine, IEEE
  • Publisher
    ieee
  • ISSN
    1070-9932
  • Type

    jour

  • DOI
    10.1109/MRA.2004.1337823
  • Filename
    1337823