DocumentCode
1119763
Title
Velocity saturation in the extrinsic device: a fundamental limit in HFET´s
Author
Greenberg, David R. ; Del Alamo, Jesus A.
Author_Institution
MIT, Cambridge, MA, USA
Volume
41
Issue
8
fYear
1994
fDate
8/1/1994 12:00:00 AM
Firstpage
1334
Lastpage
1339
Abstract
We have carried out an experimental study revealing that velocity saturation (υsat) occurring in both the extrinsic source and drain sets a fundamental limit on maximum drain current and useful gate swing in HFET´s. Using AlGaAs/n+-InGaAs HFET´s as a vehicle, we find that first gm and eventually fT decline at high currents in two stages. Initially, the approach of υsat in the extrinsic device causes the small-signal source and drain resistances (rs and rd) to rise dramatically, primarily degrading gm. As the current increases further, the large-signal source and drain resistances (Rs and Rd) grow significantly as well, pushing the intrinsic HFET toward the linear regime. Combined with the rapid rise of rs and rd, the accompanying increase in gate-drain capacitance forces fT to decline through a strongly enhanced Miller effect. We associate this two-fold mechanism with a new regime of HFET operation, which we call the parasitic-resistance blow-up regime
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; junction gate field effect transistors; AlGaAs-InGaAs; AlGaAs/n+-InGaAs HFETs; Miller effect; drain current; drain resistance; extrinsic device; gate swing; gate-drain capacitance; large-signal; linear regime; parasitic-resistance blow-up; small-signal; source resistance; transconductance; velocity saturation; Circuits; Contact resistance; Degradation; Electrons; HEMTs; MESFETs; MODFETs; Ohmic contacts; Transconductance; Vehicles;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.297726
Filename
297726
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