DocumentCode :
1119763
Title :
Velocity saturation in the extrinsic device: a fundamental limit in HFET´s
Author :
Greenberg, David R. ; Del Alamo, Jesus A.
Author_Institution :
MIT, Cambridge, MA, USA
Volume :
41
Issue :
8
fYear :
1994
fDate :
8/1/1994 12:00:00 AM
Firstpage :
1334
Lastpage :
1339
Abstract :
We have carried out an experimental study revealing that velocity saturation (υsat) occurring in both the extrinsic source and drain sets a fundamental limit on maximum drain current and useful gate swing in HFET´s. Using AlGaAs/n+-InGaAs HFET´s as a vehicle, we find that first gm and eventually fT decline at high currents in two stages. Initially, the approach of υsat in the extrinsic device causes the small-signal source and drain resistances (rs and rd) to rise dramatically, primarily degrading gm. As the current increases further, the large-signal source and drain resistances (Rs and Rd) grow significantly as well, pushing the intrinsic HFET toward the linear regime. Combined with the rapid rise of rs and rd, the accompanying increase in gate-drain capacitance forces fT to decline through a strongly enhanced Miller effect. We associate this two-fold mechanism with a new regime of HFET operation, which we call the parasitic-resistance blow-up regime
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; junction gate field effect transistors; AlGaAs-InGaAs; AlGaAs/n+-InGaAs HFETs; Miller effect; drain current; drain resistance; extrinsic device; gate swing; gate-drain capacitance; large-signal; linear regime; parasitic-resistance blow-up; small-signal; source resistance; transconductance; velocity saturation; Circuits; Contact resistance; Degradation; Electrons; HEMTs; MESFETs; MODFETs; Ohmic contacts; Transconductance; Vehicles;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.297726
Filename :
297726
Link To Document :
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