DocumentCode
1119870
Title
Semiconductor-gated InGaAs/InAlAs heterostructure transistors (SISFET´s)
Author
Feuer, M.D. ; Chang, Tao-yuan ; Shunk, S.C. ; Tell, B.
Author_Institution
AT&T Bell Laboratories, Holmdel, NJ
Volume
8
Issue
1
fYear
1987
fDate
1/1/1987 12:00:00 AM
Firstpage
33
Lastpage
35
Abstract
We have successfully fabricated FET´s with In0.53 Ga0.47 As channels, lattice-matched In0.52 Al0.48 As gate barriers, and n+ In0.53 - Ga0.47 As gates. For a barrier thickness of 600 Å and a gate length of 1.7 µm, the maximum transconductance is 250 mS/mm at T = 300 K. From gate capacitance measurements, the cutoff frequency is inferred to be ft = 15 GHz for this gate length. Self-aligned source and drain implants have been used to permit nonalloyed ohmic contacts with a characteristic resistance of 0.1 Ω.mm. The transconductance remains above 210 mS/mm for forward gate bias up to +1.0 V, confirming the usefulness of this gate structure for enhancement-mode devices.
Keywords
Argon; Contact resistance; Etching; HEMTs; Implants; Indium compounds; Indium gallium arsenide; MODFET circuits; Ohmic contacts; Transconductance;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1987.26541
Filename
1487091
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