• DocumentCode
    1119870
  • Title

    Semiconductor-gated InGaAs/InAlAs heterostructure transistors (SISFET´s)

  • Author

    Feuer, M.D. ; Chang, Tao-yuan ; Shunk, S.C. ; Tell, B.

  • Author_Institution
    AT&T Bell Laboratories, Holmdel, NJ
  • Volume
    8
  • Issue
    1
  • fYear
    1987
  • fDate
    1/1/1987 12:00:00 AM
  • Firstpage
    33
  • Lastpage
    35
  • Abstract
    We have successfully fabricated FET´s with In0.53Ga0.47As channels, lattice-matched In0.52Al0.48As gate barriers, and n+ In0.53- Ga0.47As gates. For a barrier thickness of 600 Å and a gate length of 1.7 µm, the maximum transconductance is 250 mS/mm at T = 300 K. From gate capacitance measurements, the cutoff frequency is inferred to be ft= 15 GHz for this gate length. Self-aligned source and drain implants have been used to permit nonalloyed ohmic contacts with a characteristic resistance of 0.1 Ω.mm. The transconductance remains above 210 mS/mm for forward gate bias up to +1.0 V, confirming the usefulness of this gate structure for enhancement-mode devices.
  • Keywords
    Argon; Contact resistance; Etching; HEMTs; Implants; Indium compounds; Indium gallium arsenide; MODFET circuits; Ohmic contacts; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1987.26541
  • Filename
    1487091