DocumentCode :
1120166
Title :
A lateral silicon-on-insulator bipolar transistor with a self-aligned base contact
Author :
Sturm, James C. ; McVittie, James P. ; Gibbons, James F. ; Pfeiffer, L.
Author_Institution :
Princeton University, Princeton, NJ
Volume :
8
Issue :
3
fYear :
1987
fDate :
3/1/1987 12:00:00 AM
Firstpage :
104
Lastpage :
106
Abstract :
A novel lateral bipolar transistor structure in silicon-on-insulator (SOI) is presented. The structure allows for a minimum geometry base width yet still provides for a metal contact to the entire base region. Fabricated transistors exhibit a base resistance of less than 20 Ω.
Keywords :
Bipolar transistors; Contacts; Etching; Fabrication; Implants; Lithography; MOSFETs; Resists; Silicon on insulator technology; Surface resistance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1987.26567
Filename :
1487117
Link To Document :
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