DocumentCode :
1121123
Title :
Normally-off InGaAs junction field-effect transistor with InGaAs buffer layer
Author :
Albrecht, H. ; Lauterbach, Ch.
Author_Institution :
Siemens Research Laboratories, Munich, Germany
Volume :
8
Issue :
8
fYear :
1987
fDate :
8/1/1987 12:00:00 AM
Firstpage :
353
Lastpage :
354
Abstract :
InGaAs junction field-effect transistors (JFET´s) with 1-µm gate length were successfully fabricated with an n+-InGaAs active layer (8 × 1016cm-3) and an undoped InGaAs buffer layer grown on semi-insulating InP:Fe substrate by liquid-phase epitaxy. The device showed good pinch-off behavior with a threshold voltage of 0.25 V, a low drain current of 1 µA at zero gate-source voltage, and a very high transconductance of 553 mS/mm at room temperature. This is one of the highest transconductance values ever reported for a 1-µm gate-length FET.
Keywords :
Buffer layers; Dielectric liquids; Epitaxial growth; Epitaxial layers; FETs; Indium gallium arsenide; Insulation; Substrates; Threshold voltage; Transconductance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1987.26657
Filename :
1487207
Link To Document :
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