DocumentCode :
1121226
Title :
Ga0.4In0.6As/Al0.55In0.45As pseudomorphic modulation-doped field-effect transistors
Author :
Kuo, J.M. ; Chang, Tao-yuan ; Lalevic, B.
Author_Institution :
AT&T Bell Laboratories, Holmdel, NJ
Volume :
8
Issue :
9
fYear :
1987
fDate :
9/1/1987 12:00:00 AM
Firstpage :
380
Lastpage :
382
Abstract :
High-performance pseudomorphic Ga0.4In0.6As/ Al0.55In0.45As modulation-doped field-effect transistors (MODFET´s) grown by MBE on InP have been fabricated and characterized. DC transconductances as high as 271, 227, and 197 mS/mm were obtained at 300K for 1.6-µm and 2.9-µm gate-length enhancement-mode and 2-µm depletion-mode devices, respectively. An average electron velocity as high as 2.36 × 107cm/s has been inferred for the 1.6-µm devices, which is higher than previously reported values for 1-µm gate-length Ga0.47In0.53As/Al0.48In0.52As MODFET´s. The higher bandgap Al0.55In0.45As pseudomorphic barrier also offers the advantages of a larger conduction-band discontinuity and a higher Schottky barrier height.
Keywords :
Electron mobility; Epitaxial layers; FETs; Gallium arsenide; HEMTs; Indium phosphide; MODFETs; Photonic band gap; Schottky barriers; Transconductance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1987.26667
Filename :
1487217
Link To Document :
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