• DocumentCode
    1121286
  • Title

    Exposure bleaching of nonlinear resist materials: Exact solution

  • Author

    Babu, S.V. ; Barouch, E.

  • Author_Institution
    Clarkson University, Potsdam, NY
  • Volume
    8
  • Issue
    9
  • fYear
    1987
  • fDate
    9/1/1987 12:00:00 AM
  • Firstpage
    401
  • Lastpage
    403
  • Abstract
    Dill´s model equations for the exposure bleaching of positive photoresists have been solved exactly in a closed form when the bleaching characteristics are nonlinear. As an application, the simultaneous bleaching of a positive photoresist and that of a polysilane contrast-enhancing film (CEF) is solved to determine the photoactive compound (PAC) concentration.
  • Keywords
    Bleaching; Boundary conditions; Electron devices; Lithography; Nonlinear equations; Reflectivity; Resists; Solid modeling; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1987.26674
  • Filename
    1487224
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1121286