Title :
Exposure bleaching of nonlinear resist materials: Exact solution
Author :
Babu, S.V. ; Barouch, E.
Author_Institution :
Clarkson University, Potsdam, NY
fDate :
9/1/1987 12:00:00 AM
Abstract :
Dill´s model equations for the exposure bleaching of positive photoresists have been solved exactly in a closed form when the bleaching characteristics are nonlinear. As an application, the simultaneous bleaching of a positive photoresist and that of a polysilane contrast-enhancing film (CEF) is solved to determine the photoactive compound (PAC) concentration.
Keywords :
Bleaching; Boundary conditions; Electron devices; Lithography; Nonlinear equations; Reflectivity; Resists; Solid modeling; Substrates;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1987.26674
