Title :
A high-performance BICMOS Technology with double-polysilicon self-aligned bipolar devices
Author :
Rajkanan, Kamal ; Gheewala, Tushar R. ; Diedrick, J.
Author_Institution :
Unisys Corporation, Eagan, MN
fDate :
11/1/1987 12:00:00 AM
Abstract :
A high-performance BICMOS technology is described which incorporates 12-GHz double-polysilicon self-aligned bipolar, fully salicided CMOS devices and 1-µm features. This process is applied to a new BICMOS gate design, called transistor feedback logic (TFL), to fabricate a divide-by-16 frequency divider with a maximum operating frequency of 364 MHz. Availability of uncompromised MOS and bipolar transistors allows a free mix of pure CMOS, pure bipolar, or BICMOS gates on the same chip.
Keywords :
BiCMOS integrated circuits; Boron; CMOS logic circuits; CMOS technology; Frequency conversion; Logic devices; Logic gates; MOS devices; Process design; Very large scale integration;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/EDL.1987.26711