• DocumentCode
    1121669
  • Title

    A high-performance BICMOS Technology with double-polysilicon self-aligned bipolar devices

  • Author

    Rajkanan, Kamal ; Gheewala, Tushar R. ; Diedrick, J.

  • Author_Institution
    Unisys Corporation, Eagan, MN
  • Volume
    8
  • Issue
    11
  • fYear
    1987
  • fDate
    11/1/1987 12:00:00 AM
  • Firstpage
    509
  • Lastpage
    511
  • Abstract
    A high-performance BICMOS technology is described which incorporates 12-GHz double-polysilicon self-aligned bipolar, fully salicided CMOS devices and 1-µm features. This process is applied to a new BICMOS gate design, called transistor feedback logic (TFL), to fabricate a divide-by-16 frequency divider with a maximum operating frequency of 364 MHz. Availability of uncompromised MOS and bipolar transistors allows a free mix of pure CMOS, pure bipolar, or BICMOS gates on the same chip.
  • Keywords
    BiCMOS integrated circuits; Boron; CMOS logic circuits; CMOS technology; Frequency conversion; Logic devices; Logic gates; MOS devices; Process design; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1987.26711
  • Filename
    1487261