DocumentCode :
1121669
Title :
A high-performance BICMOS Technology with double-polysilicon self-aligned bipolar devices
Author :
Rajkanan, Kamal ; Gheewala, Tushar R. ; Diedrick, J.
Author_Institution :
Unisys Corporation, Eagan, MN
Volume :
8
Issue :
11
fYear :
1987
fDate :
11/1/1987 12:00:00 AM
Firstpage :
509
Lastpage :
511
Abstract :
A high-performance BICMOS technology is described which incorporates 12-GHz double-polysilicon self-aligned bipolar, fully salicided CMOS devices and 1-µm features. This process is applied to a new BICMOS gate design, called transistor feedback logic (TFL), to fabricate a divide-by-16 frequency divider with a maximum operating frequency of 364 MHz. Availability of uncompromised MOS and bipolar transistors allows a free mix of pure CMOS, pure bipolar, or BICMOS gates on the same chip.
Keywords :
BiCMOS integrated circuits; Boron; CMOS logic circuits; CMOS technology; Frequency conversion; Logic devices; Logic gates; MOS devices; Process design; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1987.26711
Filename :
1487261
Link To Document :
بازگشت