DocumentCode
1122173
Title
Microwave-Induced Characteristics of
Stacked Josephson Junction Arrays
Author
Koda, Nobuko ; Shoji, Akira ; Yamamori, Hirotake ; Yamada, Takahiro
Author_Institution
Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
Volume
19
Issue
3
fYear
2009
fDate
6/1/2009 12:00:00 AM
Firstpage
987
Lastpage
992
Abstract
Stacked (NbN/TiNx)N/NbN (N = 2, 3, 4, 5 and 10) Josephson junctions and their arrays have been fabricated on a Si chip and their microwave-induced characteristics were measured at a temperature around 10 K. To achieve a vertical and smooth edge of an NbN - TiNx multilayer, an inductively coupled plasma reactive ion etching (ICP-RIE) technique was used. Current-voltage characteristics measured for stacks of (NbN/TiNx)N/NbN Josephson junctions without microwave indicated that critical currents for those junctions distribute in a certain range. We defined Ic - spread as (Ic MAX - Ic MIN)/Ic Average to measure the distribution of Ic. The Ic - spread was minimized when the thickness of intermediate electrodes was d = 50 nm. We also evaluated values of Ic - spread for stacks prepared at different fabrication runs as a function of the number of junctions in a stack N. As a result, we found N = 3 is the maximum for practical use. For arrays, we obtained a constant-voltage step height of about 2 m A for 2 048 stacks of double-barrier junctions (N = 2), and about 1 mA for 1 024 stacks of triple-barrier junctions (N = 3).
Keywords
Josephson effect; critical currents; multilayers; niobium compounds; silicon; sputter etching; superconducting materials; titanium compounds; (NbN-TiNx)-NbN; Si; critical currents; current-voltage characteristics; double-barrier junctions; electrodes; inductively coupled plasma reactive ion etching technique; microwave-induced characteristics; multilayer; stacked josephson junction arrays; triple-barrier junctions; Josephson junctions; multilayers; niobium compounds; plasma etching; voltage standard;
fLanguage
English
Journal_Title
Applied Superconductivity, IEEE Transactions on
Publisher
ieee
ISSN
1051-8223
Type
jour
DOI
10.1109/TASC.2009.2018520
Filename
5153043
Link To Document