• DocumentCode
    1122173
  • Title

    Microwave-Induced Characteristics of {({\\rm NbN/TiN}_{\\rm x})}_{N}/{\\rm NbN} StackedJosephson Junction Arrays

  • Author

    Koda, Nobuko ; Shoji, Akira ; Yamamori, Hirotake ; Yamada, Takahiro

  • Author_Institution
    Nat. Inst. of Adv. Ind. Sci. & Technol., Tsukuba, Japan
  • Volume
    19
  • Issue
    3
  • fYear
    2009
  • fDate
    6/1/2009 12:00:00 AM
  • Firstpage
    987
  • Lastpage
    992
  • Abstract
    Stacked (NbN/TiNx)N/NbN (N = 2, 3, 4, 5 and 10) Josephson junctions and their arrays have been fabricated on a Si chip and their microwave-induced characteristics were measured at a temperature around 10 K. To achieve a vertical and smooth edge of an NbN - TiNx multilayer, an inductively coupled plasma reactive ion etching (ICP-RIE) technique was used. Current-voltage characteristics measured for stacks of (NbN/TiNx)N/NbN Josephson junctions without microwave indicated that critical currents for those junctions distribute in a certain range. We defined Ic - spread as (Ic MAX - Ic MIN)/Ic Average to measure the distribution of Ic. The Ic - spread was minimized when the thickness of intermediate electrodes was d = 50 nm. We also evaluated values of Ic - spread for stacks prepared at different fabrication runs as a function of the number of junctions in a stack N. As a result, we found N = 3 is the maximum for practical use. For arrays, we obtained a constant-voltage step height of about 2 m A for 2 048 stacks of double-barrier junctions (N = 2), and about 1 mA for 1 024 stacks of triple-barrier junctions (N = 3).
  • Keywords
    Josephson effect; critical currents; multilayers; niobium compounds; silicon; sputter etching; superconducting materials; titanium compounds; (NbN-TiNx)-NbN; Si; critical currents; current-voltage characteristics; double-barrier junctions; electrodes; inductively coupled plasma reactive ion etching technique; microwave-induced characteristics; multilayer; stacked josephson junction arrays; triple-barrier junctions; Josephson junctions; multilayers; niobium compounds; plasma etching; voltage standard;
  • fLanguage
    English
  • Journal_Title
    Applied Superconductivity, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1051-8223
  • Type

    jour

  • DOI
    10.1109/TASC.2009.2018520
  • Filename
    5153043