• DocumentCode
    1122949
  • Title

    Time-Resolved Ion and Electron Current Measurements in Pulsed Plasma Sheaths

  • Author

    Bradley, Michael P. ; Steenkamp, Casper J T

  • Author_Institution
    Phys. & Eng. Phys. Dept., Saskatchewan Univ., Saskatoon, Sask.
  • Volume
    34
  • Issue
    4
  • fYear
    2006
  • Firstpage
    1156
  • Lastpage
    1159
  • Abstract
    In this paper, time-resolved Langmuir-probe measurements of both electron and ion currents in the transient sheath region adjacent to a plasma ion implantation target pulsed to negative high voltages are reported. A fast (i.e., greater than the ion-acoustic speed) initial sheath expansion is observed followed by a slower propagation at the ion-acoustic speed into the bulk plasma. It has been observed that the ion density exhibits perturbation near the ion plasma frequency several microseconds prior to its depletion
  • Keywords
    Langmuir probes; plasma density; plasma immersion ion implantation; plasma ion acoustic waves; plasma sheaths; plasma transport processes; Langmuir probe; electron current measurements; ion current measurements; ion density; ion plasma frequency; ion-acoustic speed; plasma ion implantation target; pulsed plasma sheaths; Current measurement; Electrons; Frequency; Ion implantation; Plasma density; Plasma immersion ion implantation; Plasma measurements; Plasma sheaths; Pulse measurements; Voltage; Ion-acoustic speed; ion plasma frequency; plasma ion implantation (PII); transient sheath;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2006.877744
  • Filename
    1673500