Title :
Mott Memory and Neuromorphic Devices
Author :
You Zhou ; Ramanathan, Shriram
Author_Institution :
John A. Paulson Sch. of Eng. & Appl. Sci., Harvard Univ., Cambridge, MA, USA
Abstract :
Orbital occupancy control in correlated oxides allows the realization of new electronic phases and collective state switching under external stimuli. The resultant structural and electronic phase transitions provide an elegant way to encode, store, and process information. In this review, we examine the utilization of Mott metal-to-insulator transitions, for memory and neuromorphic devices. We emphasize the overarching electron-phonon coupling and electron-electron interaction-driven transition mechanisms and kinetics, which renders a general description of Mott memories from aspects such as nonvolatility, sensing scheme, read/write speed, and switching energy. Various memory and neuromorphic device architectures incorporating phase transition elements are reviewed, focusing on their operational principles. The role of Peierls distortions and crystal symmetry changes during phase change is discussed. Prospects for such orbitronic devices as hardware components for information technologies are summarized.
Keywords :
Peierls instability; metal-insulator transition; neural nets; phase transformations; random-access storage; Mott memory devices; Mott metal-to-insulator transitions; Peierls distortions; collective state switching; crystal symmetry; electron-electron interaction-driven transition mechanisms; electron-phonon coupling; electronic phase transitions; information technologies; neuromorphic devices; orbital occupancy control; orbitronic devices; phase change; phase transition elements; read-write speed; sensing scheme; switching energy; Encoding; Information processing; Insulators; Magnetic hysteresis; Memory management; Neuromorphics; Random access memory; Complex oxide; Mott insulator; emerging memory; metal oxide; metal-to-insulator transition; neuromorphics; nonvolatile; orbitronics;
Journal_Title :
Proceedings of the IEEE
DOI :
10.1109/JPROC.2015.2431914