• DocumentCode
    1125937
  • Title

    Low-pressure RF discharge in the free-flight regime

  • Author

    Kaganovich, Igor D. ; Tsendin, Lev D.

  • Author_Institution
    Phys. & Technol. Dept., St. Petersburg State Univ. of Technol., Russia
  • Volume
    20
  • Issue
    2
  • fYear
    1992
  • fDate
    4/1/1992 12:00:00 AM
  • Firstpage
    86
  • Lastpage
    92
  • Abstract
    The self-consistent equations system for low-pressure RF discharge in the free-flight regime is formulated. The expressions for the electron energy diffusion coefficient due to electron-neutral collisions and to the electron collisions with the plasma-space charge moving boundary (stochastic heating) are derived. If the electron-neutral elastic collisions frequency exceeds the inelastic one, the conventional two-term approximation for the electron distribution function (EDF) can be generalized, and the space-time-averaged electron kinetic equation can be reduced to the one-dimensional energy diffusion one. The fast electrons attached to the electrode surface can also be accounted for in this equation. It is shown that in the cases of (a) spatially uniform ion profile, (b) for frequencies that are small compared with the electron bounce frequency, and (c) for frequencies exceeding the electron plasma one in the sheath, the stochastic heating vanishes
  • Keywords
    high-frequency discharges; plasma collision processes; plasma kinetic theory; plasma sheaths; plasma transport processes; elastic collisions; electrode surface; electron distribution function; electron energy diffusion coefficient; electron-neutral collisions; fast electrons; free-flight regime; frequencies; inelastic collisions; low-pressure RF discharge; plasma-space charge moving boundary; self-consistent equations system; sheath; space-time-averaged electron kinetic equation; spatially uniform ion profile; stochastic heating; two-term approximation; Distribution functions; Electrons; Equations; Heating; Kinetic theory; Nonuniform electric fields; Plasma density; Plasma sheaths; Radio frequency; Stochastic processes;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.134029
  • Filename
    134029