DocumentCode :
1126899
Title :
Formation and disappearance of defect centers in GeO2-doped silica fibers with heat treatments
Author :
Nakahara, Motohiro ; Ohmori, Yasuji ; Itoh, Hiroki ; Shimizu, Makoto ; Inagaki, Nobuo
Author_Institution :
NTT Public Corp., Musashino-shi, Tokyo, Japan
Volume :
4
Issue :
2
fYear :
1986
fDate :
2/1/1986 12:00:00 AM
Firstpage :
127
Lastpage :
132
Abstract :
Electronic state changes of defect centers in Ge-doped SiO2fibers were investigated using ESR technique. The germanium associated defects, especially Ge(3) centers, are mainly produced during the drawing process and are quenched in the fibers. The heat treatment of the Ge-doped fiber causes a remarkable decrease in the Ge(3) ESR intensity, subsequently causing OH absorption loss increase. The mechanism of this OH loss increase is proposed, in relation to the interactions between the Ge(3) centers and hydrogen.
Keywords :
Dielectric materials/devices, thermal factors; Optical fiber losses; Optical fiber materials/fabrication; Bonding; Chemicals; Germanium; Glass; Heat treatment; Hydrogen; Optical fiber losses; Paramagnetic resonance; Silicon compounds; Temperature;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.1986.1074693
Filename :
1074693
Link To Document :
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