DocumentCode :
1126900
Title :
Sterilization of dental bacteria in a flowing N2-O2 postdischarge reactor
Author :
Monna, V. ; Nguyen, C. ; Kahil, M. ; Ricard, A. ; Sixou, M.
Author_Institution :
CPAT, Univ. Paul Sabatier, Toulouse, France
Volume :
30
Issue :
4
fYear :
2002
fDate :
8/1/2002 12:00:00 AM
Firstpage :
1437
Lastpage :
1439
Abstract :
Destruction processes of several dental bacteria have been analyzed in a flowing postdischarge reactor. An N2-5%O2 gas mixture has been chosen to produce a high quantity of oxygen atoms and a UV emission intensity of NOβ bands in the whole reactor chamber. The first results obtained with Streptococcus mutans (Sm), Porphyromonas gingivalis (Pg), Fusobacterium nucleatum (Fn), Prevotella intermedia (Pi), and Escherichia coli (E. Coli) dental bacteria at initial concentrations from 106-1010 colony forming unit per milliliter (CFU/ml) introduced in small cylindrical Al substrates (previously sterilized) are reported. A full destruction of Sm, Pg, and Pi bacteria was obtained after 15-20 min and of Fn after 30 min of treatment. However, the E. coli bacteria, introduced to 1010 CFU/ml was still not destroyed after a treatment time of 30 min.
Keywords :
biological effects of radiation; biological techniques; microorganisms; plasma applications; E. Coli; Escherichia coli; Fusobacterium nucleatum; NOβ bands; Porphyromonas gingivalis; Prevotella intermedia; Streptococcus mutans; UV emission intensity; cylindrical Al substrates; dental bacteria sterilization; flowing N2-O2 postdischarge reactor; flowing postdischarge reactor; gas mixture; Dentistry; Electron tubes; Fault location; Fluid flow; Inductors; Instruments; Microorganisms; Plasma temperature; Polymers; Testing;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2002.804198
Filename :
1167636
Link To Document :
بازگشت