• DocumentCode
    1127134
  • Title

    Optimal duct bias for transport of cathodic-arc plasmas

  • Author

    Zhang, Tao ; Chu, Paul K. ; Kwok, Sunny C H ; Brown, Ian G.

  • Author_Institution
    Dept. of Phys. & Mater. Sci., City Univ. of Hong Kong, Beijing, China
  • Volume
    30
  • Issue
    4
  • fYear
    2002
  • fDate
    8/1/2002 12:00:00 AM
  • Firstpage
    1602
  • Lastpage
    1605
  • Abstract
    Carbon and titanium plasmas are used to investigate the effects of duct bias on the plasma transport through the magnetic duct of a cathodic-arc plasma source as a function of the magnetic-field strength and arc current so as to determine the optimal duct bias, at which the magnetic duct produces the maximum efficiency for plasma transport. The influence of the guiding magnetic field and arc current on the optimal duct bias is investigated. The optimal duct bias increases with the plasma density for carbon plasma, while the relationship is the opposite for the titanium plasma. The carbon-plasma behavior can be explained by a plasma-diffusion model presented in this paper, since the electron-ion collision frequency νei is less than the electron-cyclotron frequency νc,e. On the other hand, in a titanium plasma, νei is larger than νc,e, so this model is inaccurate. Our result shows that different kinds of plasmas have different transport behavior through the magnetic duct and thus, the duct parameters must be carefully chosen in order to achieve the optimal transport efficiency.
  • Keywords
    arcs (electric); carbon; plasma transport processes; titanium; C; C plasma; Ti; Ti plasma; arc current; cathodic-arc plasma source; cathodic-arc plasmas transport; electron-cyclotron frequency; electron-ion collision frequency; magnetic duct; magnetic-field strength; maximum efficiency; optimal duct bias; plasma transport; plasma-diffusion model; Ducts; Frequency; Magnetic separation; Materials science and technology; Physics; Plasma applications; Plasma density; Plasma sources; Plasma transport processes; Titanium;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2002.804169
  • Filename
    1167660