• DocumentCode
    1127295
  • Title

    The structure of SiO2, its defects and radiation hardness

  • Author

    Devine, Roderick A B

  • Author_Institution
    CNET, Meylan, France
  • Volume
    41
  • Issue
    3
  • fYear
    1994
  • fDate
    6/1/1994 12:00:00 AM
  • Firstpage
    452
  • Lastpage
    459
  • Abstract
    We review our understanding of the structure of amorphous SiO2 and the role of processing in inducing defect precursors. Five potential sources of positive trapped oxide charge and two of negative trapped charge are described. The most studied of these is the positively charged oxygen-vacancy center. Ionizing radiation is found to be ~1000 times less efficient than particle radiation in creating this defect. Various processing induced precursors of the defect and their transformation by radiation are discussed in detail. Macroscopic structural modifications induced by very large radiation doses (109 rad) are also discussed. Ionizing radiation is also found to be ~1000 times less efficient than particle radiation in inducing these modifications
  • Keywords
    noncrystalline state structure; radiation effects; radiation hardening (electronics); silicon compounds; vacancies (crystal); 10E9 rad; SiO2; amorphous SiO2; defects; ionizing radiation; negative trapped charge; oxygen-vacancy center; positive trapped oxide charge; radiation dose; radiation hardness; structure; Amorphous materials; Atmosphere; Bonding; Crystallization; Energy measurement; Goniometers; Nuclear magnetic resonance; Nuclear measurements; Oxidation; X-rays;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.299784
  • Filename
    299784