DocumentCode :
1128056
Title :
Fluorine doping and etching reactions of freon 12 in optical fiber manufacture
Author :
Marshall, Andrew ; Hallam, Keith Richard
Author_Institution :
Standard Telecommunication Laboratories, Harlow, Essex, UK
Volume :
4
Issue :
7
fYear :
1986
fDate :
7/1/1986 12:00:00 AM
Firstpage :
746
Lastpage :
750
Abstract :
The chemistry of reactions of CF2CI2used in optical fiber manufacture has been studied by infrared spectroscopy. Evidence is pesented to support a model of fluorine doping based on trichlorofluorosilane oxidation. Carbonyl fluoride has been identified as a major intermediate in the etching process.
Keywords :
Doping; Optical fiber materials/fabrication; Argon; Doping; Etching; Gases; Infrared spectra; Manufacturing; Optical fibers; Refractive index; Semiconductor process modeling; Temperature;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.1986.1074829
Filename :
1074829
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1128056
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