DocumentCode
1128056
Title
Fluorine doping and etching reactions of freon 12 in optical fiber manufacture
Author
Marshall, Andrew ; Hallam, Keith Richard
Author_Institution
Standard Telecommunication Laboratories, Harlow, Essex, UK
Volume
4
Issue
7
fYear
1986
fDate
7/1/1986 12:00:00 AM
Firstpage
746
Lastpage
750
Abstract
The chemistry of reactions of CF2CI2used in optical fiber manufacture has been studied by infrared spectroscopy. Evidence is pesented to support a model of fluorine doping based on trichlorofluorosilane oxidation. Carbonyl fluoride has been identified as a major intermediate in the etching process.
Keywords
Doping; Optical fiber materials/fabrication; Argon; Doping; Etching; Gases; Infrared spectra; Manufacturing; Optical fibers; Refractive index; Semiconductor process modeling; Temperature;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.1986.1074829
Filename
1074829
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