Ion implanted integrated optics (I3O) technology for planar lightwave circuits fabrication

Author

Drouard, Emmanuel ; Escoubas, Ludovic ; Flory, François ; Tisserand, Stéphane ; Roux, Laurent

Volume

22

Issue

10

fYear

2004

Firstpage

2310

Lastpage

2315

Abstract

The Ion Implanted Integrated Optics (I3O) technology, using titanium ion implantation in bulk silica to fabricate passive compact planar lightwave circuits (PLCs), is presented in this paper. Its advantages are described and compared with other waveguide fabrication technologies. It is demonstrated that the guided electromagnetic field can be tailored by adjusting the titanium ion dose either to fit the guided mode of standard single-mode fibers or to allow a sharp radius of curvature of bent waveguides.

Keywords

ion implantation; optical fabrication; optical planar waveguides; titanium; I3O technology; Ti; bent waveguides; ion implanted integrated optics; planar lightwave circuits fabrication; titanium ion implantation; Electromagnetic fields; Electromagnetic waveguides; Integrated circuit technology; Integrated optics; Ion implantation; Optical device fabrication; Optical waveguides; Programmable control; Silicon compounds; Titanium; Bent waveguide; fiber coupling; integrated optics; ion implantation; passive integrated circuits;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/JLT.2004.833285

Filename

1341483