• DocumentCode
    112982
  • Title

    A Practical Two-Phase Approach to Scheduling of Photolithography Production

  • Author

    Ham, Andy Myoungsoo ; Myeonsig Cho

  • Author_Institution
    Texas A&M Univ. - Commerce, Commerce, TX, USA
  • Volume
    28
  • Issue
    3
  • fYear
    2015
  • fDate
    Aug. 2015
  • Firstpage
    367
  • Lastpage
    373
  • Abstract
    The introduction of real-time dispatching (RTD) to semiconductor manufacturing has greatly improved productivities for the last two decades. Recently, researchers have revealed that data available and complexity of the algorithms to the dispatcher are limited-in effect the dispatcher has tunnel vision, dutifully rank ordering the lots in the queue, but oblivious to what is happening around it, which leads to the poor results compared to other modern optimization-based approaches. However, the author admits that most semiconductor manufacturing companies are still using RTD not only as a last-minute loading-check, but also as a scheduling logic-hub. Here comes a business need of improving the brainpower of RTD by using the optimization technologies. In this paper, we propose an integration of RTD with linear programming technique in photolithography area by using two-stage modeling. The transportation model at the first stage finds the least-cost means of assigning jobs to reticles and machines. Then, the sequencing module provides an expository sequencing decision by inheriting the same dispatching business rules. The experimental study demonstrates the proposed method can reduce the count of reticle delivery by 40.5% in a low-mix fab instances.
  • Keywords
    linear programming; photolithography; reticles; scheduling; semiconductor device manufacture; RTD; last-minute loading-check; linear programming technique; logic-hub scheduling; optimization technology; photolithography production scheduling; real-time dispatching; reticle; semiconductor manufacturing; sequencing module; two-stage modeling; Dispatching; Industries; Job shop scheduling; Lithography; Sequential analysis; Litho; Reticle; Scheduling; mixed integer programming; reticle; scheduling;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2015.2451512
  • Filename
    7140821