DocumentCode :
1129901
Title :
Mechanical Properties of Epitaxial 3C Silicon Carbide Thin Films
Author :
Jackson, Kamili M. ; Dunning, Jeremy ; Zorman, Christian A. ; Mehregany, Mehran ; Sharpe, William N., Jr.
Author_Institution :
Johns Hopkins Univ., Baltimore, MD, USA
Volume :
14
Issue :
4
fYear :
2005
Firstpage :
664
Lastpage :
672
Abstract :
Microscale tensile specimens of epitaxial 3C silicon carbide (3C-SiC) thin films were fabricated on Si substrates and tested to provide measurements of strength and elastic modulus. Samples were fabricated using both micromolding and reactive ion etching (RIE) processes to pattern the 3C-SiC films. All specimens were on the
Keywords :
elastic moduli measurement; moulding; semiconductor epitaxial layers; silicon compounds; sputter etching; tensile testing; wide band gap semiconductors; 0.5 to 2 micron; 3C silicon carbide thin films; 4 mm; 600 micron; SiC-Si; ab initio calculations; elastic modulus; epitaxial thin films; mechanical properties; micromolding process; microsample tensile testing; reactive ion etching; single crystal elastic constants; strength measurement; Anisotropic magnetoresistance; Crystalline materials; Etching; Materials testing; Mechanical factors; Mechanical variables measurement; Semiconductor thin films; Silicon carbide; Substrates; Transistors; 3C silicon carbide (3C-SiC); mechanical properties; microfabrication; tensile testing;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2005.847933
Filename :
1492417
Link To Document :
بازگشت