DocumentCode
1130777
Title
Investigation of the Reliability Behavior of Conductive-Bridging Memory Cells
Author
Symanczyk, Ralf ; Bruchhaus, Rainer ; Dittrich, Rok ; Kund, Michael
Author_Institution
Qimonda AG, Munich, Germany
Volume
30
Issue
8
fYear
2009
Firstpage
876
Lastpage
878
Abstract
Conductive-bridging memory can store information as different resistance states even when not powered. In order to check reliability challenges for nonvolatile-memory applications, the data retention has to be tested carefully. This letter describes a new test scheme using electrical bias for acceleration and enables the fast recording of such detailed information. Experimental data for memory devices based on Ag:GeS2 as the active-matrix material are presented. Excellent stability and reproducibility of the resistance states for more than 300 cycles are demonstrated in the temperature range from 25degC to 85degC. Based on the calculated activation energy, ten years of data retention is extrapolated.
Keywords
chalcogenide glasses; circuit reliability; electrical resistivity; germanium compounds; random-access storage; silver; CBRAM; GeS2:Ag; activation energy; active-matrix material; conductive-bridging memory cells; data retention; electrical bias; memory devices; reliability; resistance states; temperature 25 degC to 85 degC; CBRAM; chalcogenide; nonvolatile memory; reliability; retention;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2009.2024623
Filename
5161279
Link To Document