DocumentCode :
1130777
Title :
Investigation of the Reliability Behavior of Conductive-Bridging Memory Cells
Author :
Symanczyk, Ralf ; Bruchhaus, Rainer ; Dittrich, Rok ; Kund, Michael
Author_Institution :
Qimonda AG, Munich, Germany
Volume :
30
Issue :
8
fYear :
2009
Firstpage :
876
Lastpage :
878
Abstract :
Conductive-bridging memory can store information as different resistance states even when not powered. In order to check reliability challenges for nonvolatile-memory applications, the data retention has to be tested carefully. This letter describes a new test scheme using electrical bias for acceleration and enables the fast recording of such detailed information. Experimental data for memory devices based on Ag:GeS2 as the active-matrix material are presented. Excellent stability and reproducibility of the resistance states for more than 300 cycles are demonstrated in the temperature range from 25degC to 85degC. Based on the calculated activation energy, ten years of data retention is extrapolated.
Keywords :
chalcogenide glasses; circuit reliability; electrical resistivity; germanium compounds; random-access storage; silver; CBRAM; GeS2:Ag; activation energy; active-matrix material; conductive-bridging memory cells; data retention; electrical bias; memory devices; reliability; resistance states; temperature 25 degC to 85 degC; CBRAM; chalcogenide; nonvolatile memory; reliability; retention;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2024623
Filename :
5161279
Link To Document :
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