DocumentCode
11309
Title
Low Threshold Lasing of GaN-Based VCSELs With Sub-Nanometer Roughness Polishing
Author
Wen-jie Liu ; Shao-Qiang Chen ; Xiao-Long Hu ; Zhe Liu ; Jiang-Yong Zhang ; Lei-Ying Ying ; Xue-Qin Lv ; Akiyama, Hidenori ; Zhi-Ping Cai ; Bao-Ping Zhang
Author_Institution
Dept. of Phys., Xiamen Univ., Xiamen, China
Volume
25
Issue
20
fYear
2013
fDate
Oct.15, 2013
Firstpage
2014
Lastpage
2017
Abstract
Low threshold lasing at room temperature was achieved in optically pumped GaN-based vertical-cavity surface-emitting lasers (VCSELs) with sub-nanometer roughness polishing. The cavity region sandwiched by two dielectric distributed Bragg reflectors, incorporating InGaN/GaN multiquantum wells, a p-type AlGaN layer, and n- and p-type GaN layers, is a typical structure for electrically driven VCSELs. We observed lasing at a wavelength of 431.0 nm with a low threshold pumping energy density of ~ 3.2 mJ/cm2 and a high spontaneous emission coupling factor of ~ 0.09. These results were attributed to the significant reduction of the internal cavity loss by the removal of the high-dislocation GaN region, the reduction of cavity length, and the achievement of sub-nanometer level surface roughness (root mean square roughness of 0.3 nm) via inductively coupled plasma etching and chemical mechanical polishing. The loss mechanism is discussed and loss is quantitatively calculated in this letter.
Keywords
III-V semiconductors; aluminium compounds; chemical mechanical polishing; gallium compounds; indium compounds; laser cavity resonators; optical losses; optical pumping; semiconductor quantum wells; spontaneous emission; sputter etching; surface emitting lasers; surface roughness; wide band gap semiconductors; InGaN-GaN-AlGaN; VCSEL; cavity length reduction; cavity region; chemical mechanical polishing; dielectric distributed Bragg reflectors; inductively coupled plasma etching; internal cavity loss; low threshold lasing; multiquantum wells; n-type layer; optically pumped GaN-based vertical-cavity surface-emitting lasers; p-type layer; pumping energy density; spontaneous emission coupling factor; sub-nanometer roughness polishing; surface roughness; temperature 293 K to 298 K; wavelength 431.0 nm; Gallium nitride; Optical surface waves; Rough surfaces; Surface roughness; Vertical cavity surface emitting lasers; VCSEL; low threshold lasing; sub-nanometer roughness;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/LPT.2013.2280965
Filename
6600971
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