• DocumentCode
    1131558
  • Title

    Bandwidth engineering of photonic crystal waveguide bends

  • Author

    Borel, P.I. ; Frandsen, L.H. ; Harpth, A. ; Leon, J.B. ; Liu, H. ; Kristensen, M. ; Bogaerts, W. ; Dumon, P. ; Baets, R. ; Wiaux, V. ; Wouters, J. ; Beckx, S.

  • Author_Institution
    Res. Center COM, Tech. Univ. of Denmark, Lyngby, Denmark
  • Volume
    40
  • Issue
    20
  • fYear
    2004
  • Firstpage
    1263
  • Lastpage
    1264
  • Abstract
    An effective design principle has been applied to photonic crystal waveguide bends fabricated in silicon-on-insulator material using deep UV lithography resulting in a large increase in the low-loss bandwidth of the bends. Furthermore, it is experimentally demonstrated that the absolute bandwidth range can be adjusted in a post-fabrication thermal oxidation process.
  • Keywords
    elemental semiconductors; optical waveguides; oxidation; photonic crystals; silicon-on-insulator; ultraviolet lithography; Si; UV lithography; bandwidth engineering; photonic crystal waveguide bends; silicon-on-insulator material; thermal oxidation process;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20046206
  • Filename
    1342182
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1131558