Title :
Low-Temperature Atmospheric-Pressure-Plasma Jet for Thin-Film Deposition
Author :
Huang, Chun ; Hsu, Wen-Tung ; Liu, Chi-Hung ; Wu, Shin-Yi ; Yang, Shih-Hsien ; Chen, Tai-Hung ; Wei, Ta-Chin
Author_Institution :
Dept. of Chem. Eng. & Mater. Sci., Yuan Ze Univ., Chungli
fDate :
7/1/2009 12:00:00 AM
Abstract :
A novel plasma system based on double-pipe method was generated for the development of an atmospheric-pressure-plasma jet (APPJ). This APPJ deposits homogeneous thin films without unfavorable contamination in plasma source. The experimentally measured gas-phase temperature of the argon APPJ maintained at RF electric power was around 40degC-80degC, indicating this APPJ to be a low-temperature plasma. This plasma system will provide a chamber less deposition for coating application.
Keywords :
argon; plasma deposited coatings; plasma deposition; plasma jets; plasma sources; plasma temperature; Ar; RF electric power; argon APPJ; double-pipe method; gas-phase temperature; low-temperature atmospheric-pressure plasma jet; plasma source; thin film deposition; Atmospheric-pressure-plasma jet (APPJ); plasma CVD; plasma applications; plasma devices;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2008.2011636
