• DocumentCode
    113278
  • Title

    TSV-based 3D integration fabrication technologies: An overview

  • Author

    Salah, Khaled

  • Author_Institution
    Mentor Graphics, Cairo, Egypt
  • fYear
    2014
  • fDate
    16-18 Dec. 2014
  • Firstpage
    253
  • Lastpage
    256
  • Abstract
    3D Integration is a promising and attractive solution for interconnect bottleneck problem, transistor scaling physical limitations, and impractical small-scale lithography. 3D integration extends Moore´s law in the third dimension, offering heterogeneous integration, higher density, lower power consumption, and faster performance. However, in order to fabricate 3D ICs, new capabilities are needed: process technology, physical modeling, physical design tools, 3D architectures, design methods and tools. The goal of this paper is to cover the manufacturability of TSV-based 3D-ICs Le. process technology, and fabrication capability.
  • Keywords
    integrated circuit design; integrated circuit interconnections; integrated circuit manufacture; integrated circuit modelling; semiconductor process modelling; three-dimensional integrated circuits; 3D ICs; 3D architectures; TSV-based 3D integration fabrication; design methods; physical design tools; physical modeling; process technology; Bonding; Silicon; Stacking; Substrates; Three-dimensional displays; Through-silicon vias; 3D Integration; 3D Process; 3D Technology; 3D fabrication; 3D technologies; TSV;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design & Test Symposium (IDT), 2014 9th International
  • Conference_Location
    Algiers
  • Type

    conf

  • DOI
    10.1109/IDT.2014.7038623
  • Filename
    7038623