• DocumentCode
    113321
  • Title

    Issues in source calibration for biased target ion beam deposition

  • Author

    Radhakrishnan, N. ; Jeffery, R.D. ; Martyniuk, M. ; Woodward, R.C. ; Dell, J.H. ; Faraone, L.

  • Author_Institution
    Sch. of Electr. Electron. & Comput. Sci. Eng., Univ. of Western Australia, Perth, WA, Australia
  • fYear
    2014
  • fDate
    14-17 Dec. 2014
  • Firstpage
    141
  • Lastpage
    143
  • Abstract
    We report issues associated with the calibration of a biased target ion beam deposition system. Variations in deposition rates and oxygen flow have been observed when depositing individual metal oxide films immediately after films deposited from different targets as compared to depositions following films from the same target.
  • Keywords
    bismuth compounds; calibration; cerium compounds; ion beam assisted deposition; thin films; (CeBi)3Fe5O12; biased target ion beam deposition; deposition rates; metal oxide films; oxygen flow; source calibration; Australia; Bismuth; Cerium; Educational institutions; Films; Iron; bismuth oxide; cerium oxide; chamber evacuation; chamber passivation; deposition rate; iron oxide; target poisoning;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2014 Conference on
  • Conference_Location
    Perth, WA
  • Print_ISBN
    978-1-4799-6867-1
  • Type

    conf

  • DOI
    10.1109/COMMAD.2014.7038674
  • Filename
    7038674
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=113321