DocumentCode :
1133573
Title :
Modeling TANOS Memory Program Transients to Investigate Charge-Trapping Dynamics
Author :
Padovani, Andrea ; Larcher, Luca ; Heh, Dawei ; Bersuker, Gennadi
Author_Institution :
DISMI, Univ. di Modena e Reggio Emilia, Reggio Emilia, Italy
Volume :
30
Issue :
8
fYear :
2009
Firstpage :
882
Lastpage :
884
Abstract :
A novel physics-based drift-diffusion model of TANOS program transients is employed to investigate electron trapping and detrapping dynamics in a nitride trapping layer. Trapping process is found to be independent from the energy of injected electrons, while detrapping is dominated by trap-to-band tunneling. Modeling of the trapped-charge evolution during program transients allows one to extract physical characteristics of the traps and provides useful information for the optimization of TANOS memories.
Keywords :
aluminium compounds; electron traps; flash memories; silicon; silicon compounds; tantalum compounds; Si-SiO2-SiN-Al2O3-TaN; TANOS memory program transients; charge-trapping dynamics; drift-diffusion model; flash memories; Charge-trapping memory; Shockley–Read–Hall (SRH); TANOS; device physics; flash memory; nitride-based trapping storage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2009.2024622
Filename :
5164923
Link To Document :
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