• DocumentCode
    113360
  • Title

    Nanoscale polymer electrolytes: Fabrication and applications using nanowire transistors

  • Author

    Carrad, Damon J. ; Burke, Adam M. ; Svensson, Sofia Fahlvik ; Lyttleton, Roman W. ; Joyce, Hannah J. ; Hark Hoe Tan ; Jagadish, Chennupati ; Storm, Kristian ; Samuelson, Lars ; Linke, Heiner ; Micolich, Adam P.

  • Author_Institution
    Sch. of Phys., Univ. of New South Wales, Sydney, NSW, Australia
  • fYear
    2014
  • fDate
    14-17 Dec. 2014
  • Firstpage
    286
  • Lastpage
    289
  • Abstract
    We present a method to pattern the poly(ethylene oxide)/LiClO4 polymer electrolyte on the nm-scale by electron beam lithography. We use the patterned polymer electrolyte as a high capacitance gate dielectric for InAs nanowire transistors in a `wrap-gate´ geometry. Patterning enabled multiple independently controllable gates on the same device, which exhibit stability and subthreshold characteristics comparable to conventional metal/oxide wrap-gates at room temperature. The strong tuning at room temperature combined with the `freeze-out´ of Li+/ClO4- transport for T <; 220 K allows a wide range of charge environments to be set and held for quantum transport measurements. The simplicity of fabrication and excellent gate characteristics broadens the scope for polymer electrolyte gating in studies of nanowires and other nanoscale devices.
  • Keywords
    capacitance; electron beam lithography; field effect transistors; lithium compounds; nanopatterning; nanowires; polymer electrolytes; LiClO4; electron beam lithography; high capacitance gate dielectric; nanoscale polymer electrolytes; nanowire transistors; poly(ethylene oxide); quantum transport measurements; subthreshold characteristics; temperature 293 K to 298 K; wrap gate geometry; Electric potential; Logic gates; Nanoscale devices; Polymers; Quantum dots; Temperature measurement; Transistors; III-V nanowires; electron beam lithography; polymer electrolytes; quantum transport;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronic and Microelectronic Materials & Devices (COMMAD), 2014 Conference on
  • Conference_Location
    Perth, WA
  • Print_ISBN
    978-1-4799-6867-1
  • Type

    conf

  • DOI
    10.1109/COMMAD.2014.7038713
  • Filename
    7038713