• DocumentCode
    1133829
  • Title

    Statistical process control in semiconductor manufacturing

  • Author

    Spanos, Costas J.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
  • Volume
    80
  • Issue
    6
  • fYear
    1992
  • fDate
    6/1/1992 12:00:00 AM
  • Firstpage
    819
  • Lastpage
    830
  • Abstract
    The author presents a brief survey of standard SPC (statistical process control) schemes, and illustrates them through examples taken from the semiconductor industry. These methods range from contamination control to the monitoring of continuous process parameters. It is noted that, even as SPC is transforming IC production, the peculiarities of semiconductor manufacturing technology are transforming SPC. Therefore, the author describes novel SPC applications which are now emerging in semiconductor production. These methods are being developed to monitor the short production runs that are characteristic of flexible manufacturing. Additional SPC techniques suitable for in situ multivariate sensor readings are also discussed
  • Keywords
    flexible manufacturing systems; integrated circuit manufacture; monitoring; statistical process control; IC production; SPC; contamination control; flexible manufacturing; in situ multivariate sensor readings; process parameter monitoring; semiconductor manufacturing; statistical process control; Computer integrated manufacturing; Control charts; Fabrication; Integrated circuit manufacture; Manufacturing industries; Manufacturing processes; Process control; Production; Semiconductor device manufacture; Technological innovation;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/5.149445
  • Filename
    149445