DocumentCode
1134796
Title
Design and fabrication of thin film resistive heaters for hybrid optoelectronic packaging
Author
Datta, Madhumita ; Whaley, Ralph D., Jr. ; Dagenais, Mario
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Maryland, College Park, MD, USA
Volume
25
Issue
4
fYear
2002
fDate
11/1/2002 12:00:00 AM
Firstpage
495
Lastpage
502
Abstract
This paper presents the technology for the design and fabrication of planar resistive heaters made from vacuum deposited nichrome thin films on a quartz substrate. These heaters are suitable as isolated local heat sources for melting solder to attach discrete components on a hybrid optoelectronic integration platform. Numerical simulations are performed using the Finite Element Method (FEM) to determine the geometry of the heaters in order to deliver adequate thermal performance. Multiple heater elements are batch processed on a 3.0 in polished fused quartz wafer using standard photolithographic techniques. Use of polyimide as a reliable insulation layer between the nichrome thin film and the solder has improved the thermal uniformity over the heater surface. Individual heaters can reach temperatures close to 300°C drawing 7.1 W of power on an uncooled alumina platform and 12.0 W on an uncooled copper platform. This temperature is high enough to melt gold-tin (AuSn) solder (with eutectic melting point of 280°C), typically used for attaching different optoelectronic components on a substrate.
Keywords
batch processing (industrial); chromium alloys; finite element analysis; heating elements; hybrid integrated circuits; integrated circuit packaging; integrated optoelectronics; metallic thin films; multichip modules; nickel alloys; resistance heating; soldering; temperature distribution; vacuum deposited coatings; 12.0 W; 280 C; 3.0 in; 300 C; 7.1 W; AuSn; AuSn eutectic solder; FEM; NiCr; SiO2; batch processing; discrete component attachment; heater geometry; hybrid optoelectronic integration platform; hybrid optoelectronic packaging; isolated local heat source; multiple heater elements; numerical simulations; photolithographic techniques; planar resistive heaters; polished fused quartz wafer; polyimide insulation layer; quartz substrate; solder melting; thermal performance; thermal uniformity; thin film resistive heaters; uncooled alumina platform; uncooled copper platform; vacuum deposited nichrome thin film; Finite element methods; Isolation technology; Numerical simulation; Optical device fabrication; Packaging; Sputtering; Substrates; Temperature; Transistors; Vacuum technology;
fLanguage
English
Journal_Title
Advanced Packaging, IEEE Transactions on
Publisher
ieee
ISSN
1521-3323
Type
jour
DOI
10.1109/TADVP.2002.807605
Filename
1176475
Link To Document