Extremely small AWG demultiplexer fabricated on InP by using a double-etch Process

Author

Barbarin, Y. ; Leijtens, X.J.M. ; Bente, E.A.J.M. ; Louzao, C.M. ; Kooiman, J.R. ; Smit, M.K.

Author_Institution

COBRA, Eindhoven Univ. of Technol., Netherlands

Volume

16

Issue

11

fYear

2004

Firstpage

2478

Lastpage

2480

Abstract

A compact low-loss 4×4 arrayed waveguide grating (AWG) demultiplexer with a channel spacing of 400 GHz is presented. By employing a double-etch process, a low-loss device is made with deeply etched waveguides that have a bending radius down to 30 μm. This small radius and a reduction of the number of array arms, reduces the device size to only 230×330 μm². Measured insertion losses are less than 5 dB and the crosstalk is below -12 dB. To our knowledge, this is the smallest AWG reported to date.

Keywords

III-V semiconductors; arrayed waveguide gratings; channel spacing; demultiplexing equipment; etching; indium compounds; integrated optics; micro-optics; optical communication equipment; optical crosstalk; optical fabrication; optical losses; wavelength division multiplexing; 230 mum; 330 mum; 400 GHz; InP; arrayed waveguide grating; bending; channel spacing; crosstalk; deeply-etched waveguides; double-etch process; extremely small AWG demultiplexer; insertion losses; integrated optics; low-loss device; optical fabrication; semiconductor waveguide; wavelength-division multiplexing; Arm; Arrayed waveguide gratings; Channel spacing; Crosstalk; Etching; Indium phosphide; Insertion loss; Optical waveguides; Photonic band gap; Semiconductor waveguides;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2004.835217

Filename

1344073