Simultaneous UV direct writing of channel waveguides and Bragg gratings in germanium-doped planar silica

Author

Marques, Paulo V S ; Bonar, Jim R. ; Leite, António M P ; Aitchison, J.S.

Volume

8

Issue

6

fYear

2002

Firstpage

1316

Lastpage

1322

Abstract

Channel waveguides incorporating photo-imprinted Bragg gratings were produced in germano-borosilicate glass layers fabricated by flame hydrolysis deposition, through single- and double-step exposure direct writing processes with UV laser irradiation. To our knowledge, this is the first time that UV exposure has been used to simultaneously realize both waveguiding and spectral selectivity functions.

Keywords

Bragg gratings; borosilicate glasses; germanate glasses; optical fabrication; optical glass; optical planar waveguides; ultraviolet lithography; B₂O₃-SiO₂:Ge; GeO₂-B₂O₃-SiO₂; UV exposure; UV laser irradiation; channel waveguides; double-step exposure direct writing processes; flame hydrolysis deposition; germanium-doped planar silica; germano-borosilicate glass layers; photo-imprinted Bragg gratings; simultaneous UV direct writing; single-step exposure direct writing processes; spectral selectivity functions; waveguiding functions; Bragg gratings; Etching; Fires; Glass; Optical waveguides; Planar waveguides; Silicon compounds; Ultraviolet sources; Waveguide lasers; Writing;

fLanguage

English

Journal_Title

Selected Topics in Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

1077-260X

Type

jour

DOI

10.1109/JSTQE.2002.806730

Filename

1176675