DocumentCode :
1139573
Title :
Nonpolar Nonvolatile Resistive Switching in Cu Doped \\hbox {ZrO}_{2}
Author :
Guan, Weihua ; Long, Shibing ; Liu, Qi ; Liu, Ming ; Wang, Wei
Author_Institution :
Chinese Acad. of Sci., Beijing
Volume :
29
Issue :
5
fYear :
2008
fDate :
5/1/2008 12:00:00 AM
Firstpage :
434
Lastpage :
437
Abstract :
In this letter, the unique reproducible nonpolar resistive switching behavior is reported in the Cu-doped ZrO2 memory devices. The devices are with the sandwiched structure of Cu/ZrO2:Cu/Pt. The switching between high resistance state (OFF-state) and low resistance state (ON-state) does not depend on the polarity of the applied voltage bias and can be achieved under both voltage sweeping and voltage pulse. The ratio between the high and low resistance is on the order of 106. Set and Reset operation in voltage pulse mode can be as fast as 50 and 100 ns, respectively. No data loss is found upon continuous readout for more than 104 s. Multilevel storage is considered feasible due to the dependence of ON-state resistance on Set compliance current. The switching mechanism is believed to be related with the formation and rupture of conducting filamentary paths.
Keywords :
random-access storage; storage management chips; switching circuits; Cu; ZrO2; applied voltage bias; filamentary path; memory device; multilevel storage; nonpolar nonvolatile resistive switching; voltage pulse; voltage sweeping; CMOS technology; Dielectrics and electrical insulation; Doping; Electrodes; Gold; Metal-insulator structures; Nonvolatile memory; Random access memory; Temperature; Voltage; $ hbox{ZrO}_{2}$ ; Cu doping; nonvolatile memory (NVM); resistive random access memory (ReRAM); resistive switching;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2008.919602
Filename :
4494620
Link To Document :
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