• DocumentCode
    1140050
  • Title

    The Dose Effect in Secondary Electron Emission

  • Author

    Kumar, Prashanth ; Watts, Christopher ; Svimonishvili, Tengiz ; Gilmore, Mark ; Schamiloglu, Edl

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of New Mexico, Albuquerque, NM, USA
  • Volume
    37
  • Issue
    8
  • fYear
    2009
  • Firstpage
    1537
  • Lastpage
    1551
  • Abstract
    In this paper, total incident electron dose as an inherent parameter in secondary electron emission is experimentally demonstrated. A completely automated experimental setup allows for measuring of secondary electron yield (SEY) as a function of beam energy, angle of incidence of primary electrons, electron dose, and time. SEY data are presented for copper, plasma-sprayed boron carbide, and titanium nitride samples with principal focus on dose dependence. Experiments were conducted in the low-energy range (5-1000 eV) and direct-current regime. Experimental results have been compared with formulas in literature, and good agreement was observed. Modified empirical formulas incorporating the dose effect have also been proposed.
  • Keywords
    boron compounds; copper; plasma arc spraying; plasma-beam interactions; secondary electron emission; titanium compounds; B4C; Cu; TiN; copper; dose effect; electron volt energy 5 eV to 1 keV; high-power microwaves; plasma-sprayed boron carbide; secondary electron emission; secondary electron yield; titanium nitride; Dose effect; high-power microwaves (HPMs); secondary electron emission (SEE); secondary electron yield (SEY);
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2009.2022970
  • Filename
    5166523