DocumentCode :
1140542
Title :
Band-Structure Effects on the Performance of III–V Ultrathin-Body SOI MOSFETs
Author :
Liu, Yang ; Neophytou, Neophytos ; Klimeck, Gerhard ; Lundstrom, Mark S.
Author_Institution :
Purdue Univ., West Lafayette
Volume :
55
Issue :
5
fYear :
2008
fDate :
5/1/2008 12:00:00 AM
Firstpage :
1116
Lastpage :
1122
Abstract :
This paper examines the impact of band structure on deeply scaled III-V devices by using a self-consistent 20-band -SO semiempirical atomistic tight-binding model. The density of states and the ballistic transport for both GaAs and InAs ultrathin-body n-MOSFETs are calculated and compared with the commonly used bulk effective mass approximation, including all the valleys (, , and ). Our results show that for III-V semiconductors under strong quantum confinement, the conduction band nonparabolicity affects the confinement effective masses and, therefore, changes the relative importance of different valleys. A parabolic effective mass model with bulk effective masses fails to capture these effects and leads to significant errors, and therefore, a rigorous treatment of the full band structure is required.
Keywords :
III-V semiconductors; MOSFET; ballistic transport; band structure; silicon-on-insulator; tight-binding calculations; III-V ultrathin-body SOI MOSFET; ballistic transport; band-structure effects; mass approximation; semiempirical atomistic tight-binding model; Atomic measurements; Ballistic transport; CMOS technology; Dielectric materials; Effective mass; Gallium arsenide; Inorganic materials; MOSFET circuits; Potential well; Semiconductor materials; Band structure; III–V; MOSFETs; effective mass; injection velocity; nonparabolicity; quantum confinement; tight binding (TB); ultrathin body (UTB);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2008.919290
Filename :
4494720
Link To Document :
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