Title :
Designed Workfunction Engineering of Double-Stacked Metal Nanocrystals for Nonvolatile Memory Application
Author :
Ryu, Seong-Wan ; Lee, Jong-Won ; Han, Jin-Woo ; Kim, Sungho ; Choi, Yang-Kyu
Author_Institution :
Sch. of Electr. Eng. & Comput. Sci., Korea Adv. Inst. of Sci. & Technol., Daejeon
fDate :
3/1/2009 12:00:00 AM
Abstract :
A double-stacked nanocrystal (DSNC) flash memory is presented for improvement of both program/erase (P/E) speed and data retention time. Four combinations of nickel (Ni) and gold (Au) (Ni/Ni, Au/Au, Ni/Au, and Au/Ni) are used as charge storage DSNC materials and are compared from the perspective of memory performance. Through experimental results for P/E efficiency and retention time, the optimized energy band lineup for faster P/E and longer charge retention is presented. A combination of a deep potential well at the top and a shallow potential well at the bottom exhibits optimized performance in P/E, and this combination also shows the longest data retention characteristics.
Keywords :
band structure; flash memories; gold; nanostructured materials; nickel; random-access storage; work function; Au-Au; Au-Ni; DSNC flash memory; Ni-Au; Ni-Ni; charge retention; charge storage material; data retention time; double-stacked metal nanocrystals; energy band lineup; nickel-gold nanocrystals; nonvolatile memory application; potential well; program-erase speed; workfunction engineering; Design engineering; Dielectrics; Flash memory; Gold; Material storage; Nanocrystals; Nickel; Nonvolatile memory; Potential well; Tunneling; Au and Ni; double-stacked nanocrystal (DSNC); energy band lineup; flash memory; nanocrystal (NC); nanocrystal floating-gate memory (NFGM); nonvolatile memory (NVM); program/erase (P/E) speed; retention time;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2008.2011677