DocumentCode :
1141298
Title :
All-epitaxial current- and mode-confined AlGaAs/GaAs VCSEL
Author :
Lu, D. ; Ahn, J. ; Deppe, D.G.
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Texas, Austin, TX, USA
Volume :
40
Issue :
21
fYear :
2004
Firstpage :
1336
Lastpage :
1337
Abstract :
An all-epitaxial current- and mode-confining vertical-cavity surface-emitting laser is demonstrated that eliminates the need for any post-growth oxidation step. The current and optical mode are self-aligned and confined to the same lithographically defined area in an AlGaAs cavity.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; semiconductor epitaxial layers; semiconductor lasers; surface emitting lasers; AlGaAs-GaAs; VCSEL; all-epitaxial current vertical-cavity surface-emitting laser; lithography; mode-confining vertical-cavity surface emitting laser; optical mode; post-growth oxidation; vertical-cavity surface-emitting laser;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20046159
Filename :
1344885
Link To Document :
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