DocumentCode
1141662
Title
Demonstration of first 9.2 kV 4H-SiC bipolar junction transistor
Author
Zhang, J. ; Zhao, J.H. ; Alexandrov, P. ; Burke, T.
Author_Institution
Dept. of Electr. and Comput. Eng., Rutgers Univ., Piscataway, NJ, USA
Volume
40
Issue
21
fYear
2004
Firstpage
1381
Lastpage
1382
Abstract
The first demonstration is reported of a high-voltage (9.2 kV) 4H-SiC bipolar junction transistor (BJT) based on a 50 μm, 7×1014 cm-3 doped drift layer, achieving an emitter current density of 150 A/cm2 at VCEO=5 V, suggesting a specific on-resistance (RSP_ON) of 33 mΩ cm2 without considering current spreading or 49 mΩ cm2 if current spreading is considered. The result far exceeds the previous 4H-SiC BJT record of 3.2 kV with RSP_ON=78 mΩ cm2.
Keywords
bipolar transistors; current density; electric resistance; silicon compounds; wide band gap semiconductors; 3.2 kV; 4H-SiC bipolar junction transistor; 5 V; 50 micron; 9.2 kV; SiC; drift layer; electric resistance; emitter current density;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20046223
Filename
1344914
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