• DocumentCode
    1141662
  • Title

    Demonstration of first 9.2 kV 4H-SiC bipolar junction transistor

  • Author

    Zhang, J. ; Zhao, J.H. ; Alexandrov, P. ; Burke, T.

  • Author_Institution
    Dept. of Electr. and Comput. Eng., Rutgers Univ., Piscataway, NJ, USA
  • Volume
    40
  • Issue
    21
  • fYear
    2004
  • Firstpage
    1381
  • Lastpage
    1382
  • Abstract
    The first demonstration is reported of a high-voltage (9.2 kV) 4H-SiC bipolar junction transistor (BJT) based on a 50 μm, 7×1014 cm-3 doped drift layer, achieving an emitter current density of 150 A/cm2 at VCEO=5 V, suggesting a specific on-resistance (RSP_ON) of 33 mΩ cm2 without considering current spreading or 49 mΩ cm2 if current spreading is considered. The result far exceeds the previous 4H-SiC BJT record of 3.2 kV with RSP_ON=78 mΩ cm2.
  • Keywords
    bipolar transistors; current density; electric resistance; silicon compounds; wide band gap semiconductors; 3.2 kV; 4H-SiC bipolar junction transistor; 5 V; 50 micron; 9.2 kV; SiC; drift layer; electric resistance; emitter current density;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20046223
  • Filename
    1344914