DocumentCode
1141971
Title
Low-frequency noise measurements on semiconductor devices using a probe station
Author
Chaar, Lana R. ; van Rheenen, Arthur D.
Author_Institution
Dept. of Electr. Eng., Minnesota Univ., Minneapolis, MN, USA
Volume
43
Issue
4
fYear
1994
fDate
8/1/1994 12:00:00 AM
Firstpage
658
Lastpage
660
Abstract
We report a measurement technique that would allow the mapping of the low-frequency noise characteristics of devices across a wafer. We show that we can reliably measure the noise by using a probe station. We also show that the sensitivity of the setup is not limited by the probes
Keywords
electric noise measurement; probes; random noise; semiconductor device noise; semiconductor device testing; spectral analysis; FFT spectrum analyser; current noise spectra; low-frequency noise measurements; mapping; probe pad contacts; probe station; semiconductor devices; sensitivity; Bonding; Electrical resistance measurement; Low-frequency noise; Noise measurement; Packaging; Probes; Resistors; Semiconductor device measurement; Semiconductor devices; Time measurement;
fLanguage
English
Journal_Title
Instrumentation and Measurement, IEEE Transactions on
Publisher
ieee
ISSN
0018-9456
Type
jour
DOI
10.1109/19.310184
Filename
310184
Link To Document