DocumentCode :
1141971
Title :
Low-frequency noise measurements on semiconductor devices using a probe station
Author :
Chaar, Lana R. ; van Rheenen, Arthur D.
Author_Institution :
Dept. of Electr. Eng., Minnesota Univ., Minneapolis, MN, USA
Volume :
43
Issue :
4
fYear :
1994
fDate :
8/1/1994 12:00:00 AM
Firstpage :
658
Lastpage :
660
Abstract :
We report a measurement technique that would allow the mapping of the low-frequency noise characteristics of devices across a wafer. We show that we can reliably measure the noise by using a probe station. We also show that the sensitivity of the setup is not limited by the probes
Keywords :
electric noise measurement; probes; random noise; semiconductor device noise; semiconductor device testing; spectral analysis; FFT spectrum analyser; current noise spectra; low-frequency noise measurements; mapping; probe pad contacts; probe station; semiconductor devices; sensitivity; Bonding; Electrical resistance measurement; Low-frequency noise; Noise measurement; Packaging; Probes; Resistors; Semiconductor device measurement; Semiconductor devices; Time measurement;
fLanguage :
English
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9456
Type :
jour
DOI :
10.1109/19.310184
Filename :
310184
Link To Document :
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