DocumentCode :
1142701
Title :
Technique for the Rapid Characterization of Parametric Distributions
Author :
Hayes, Jerry D. ; Agarwal, Kanak ; Nassif, Sani R.
Author_Institution :
IBM Austin Res. Labs., Austin, TX, USA
Volume :
22
Issue :
1
fYear :
2009
Firstpage :
66
Lastpage :
71
Abstract :
We present a technique for fast characterization of the statistical mean and sigma of parametric variations. The technique uses a scan chain to sequentially cycle through a device array, creating a periodic waveform that can be directly measured using a multimeter. The dc and root-mean square values of the waveform directly give the mean and sigma of the parameter distribution. We show the technique is sufficiently general and can be applied to a wide range of characterization strategies. A VTH characterization array was implemented in a 65-nm bulk CMOS process where we compare traditional individual device measurements for calculating statistics with the direct mean and sigma measurement technique using the multimeter.
Keywords :
CMOS integrated circuits; statistical distributions; CMOS process; mean and sigma measurement; parametric distributions; periodic waveform; scan chain; CMOS process; Circuit optimization; Circuit testing; Measurement techniques; Monitoring; Ring oscillators; Statistical analysis; Statistical distributions; Threshold voltage; Time measurement; Process monitoring; random dopant fluctuation; test structure; threshold voltage;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/TSM.2008.2010732
Filename :
4773492
Link To Document :
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